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The SIMS technique consists essentially of bombarding the sample of interest with a primary, low energy ion beam, usually of energy between 3 and 15 keV. Interaction of the primary ions with the target causes material to be ejected from the sample surface. This process is called sputtering and produces a number of atomic and molecular species, most of which are neutral. A small proportion, however, are singly or even multiply charged and it is possible to collect some of the charged species (the secondary ions) through the application of a suitable electrical potential.