Secondary Ion Mass Spectrometry (SIMS) Technology

Secondary ion mass spectrometry (SIMS) is a surface analysis technology based on mass spectrometry. The principle is that by bombarding the surface of the sample with a number of kev ion beams (usually O2+/Cs+), a series of physical and chemical reactions are triggered in the bombarding region, including primary ion scattering, atomic groups, positive and negative ion sputtering and surface chemical reactions, so that the atoms or atomic groups on the surface of the sample absorb energy and sputtering from the surface to produce secondary ions. After these charged ions pass through the mass analyzer, a mass spectrum of information about the sample surface can be obtained. This technology can be applied to materials, biology, drug metabolism analysis and other fields.