Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS)

Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) is a powerful surface analysis technique used to determine the elemental and molecular composition of materials at the atomic scale. TOF-SIMS works by bombarding a sample's surface with a beam of high-energy primary ions. This generates secondary ions, which are then separated based on their mass-to-charge ratio and time of flight, allowing for highly precise and detailed analysis of the sample's surface chemistry. TOF-SIMS is employed in various fields, including materials science, surface chemistry, semiconductor manufacturing, and biomaterials research. Its ability to provide depth profiling and detect minute concentrations of elements and molecules makes it invaluable for understanding material composition and structure at the nanoscale.