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Nanostructure Analysis Service Based on FEI Helios NanoLab DualBeam FIB-SEM

STEMart provides cutting-edge Nanostructure Analysis Services using the advanced FEI Helios NanoLab DualBeam FIB-SEM. This state-of-the-art equipment combines focused ion beam (FIB) technology with scanning electron microscopy (SEM) to deliver high-resolution imaging and nanofabrication capabilities. The FEI Helios NanoLab is ideal for studying the intricate details of nanostructures across a range of materials, from semiconductors to biological specimens, ensuring accurate and comprehensive analysis.

The FEI Helios NanoLab DualBeam FIB-SEM operates by using a finely focused ion beam to modify, cut, or mill samples, while simultaneously capturing high-resolution images with the electron beam. This dual approach allows for precise sample preparation and characterization at the nanoscale. The system is equipped with advanced detectors for secondary and backscattered electrons, providing unparalleled detail in surface and subsurface analysis.

Leveraging our expertise and the powerful capabilities of the FEI Helios NanoLab, STEMart offers a variety of nanostructure analysis services, including 3D reconstructions, nanofabrication, and detailed surface studies. Our services are tailored to meet the diverse needs of industries such as materials science, electronics, and biotechnology.

What We Offer

  • Focused Ion Beam Milling

Precision milling and cross-sectioning of nanostructures for internal analysis, enabling targeted investigation of specific areas within materials.

  • Electron Beam-Induced Deposition (EBID)

Utilize EBID for nanofabrication and modification of samples, allowing the creation of custom structures and patterns at the nanoscale.

  • Subsurface Defect Analysis

Detect and analyze subsurface defects in semiconductor devices, composite materials, and biological tissues using the powerful combination of FIB and SEM imaging.

  • TEM Sample Preparation

High-quality lamella preparation for transmission electron microscopy (TEM), ensuring the finest sample sections for subsequent high-resolution imaging and analysis.

Why Choose Us

  • High Precision and Versatility

Our FEI Helios NanoLab DualBeam FIB-SEM provides highly accurate nanoscale imaging and milling, offering unmatched flexibility in sample analysis.

  • Advanced Nanofabrication Capabilities

With the ability to perform nanofabrication through EBID, we can create intricate nanoscale structures for research and development applications.

  • Expert Support for Complex Projects

Our team of experts works closely with you to develop tailored solutions for even the most complex nanostructure challenges, ensuring accurate and relevant results.

Our Equipment

FEI Helios NanoLab DualBeam FIB-SEM

The FEI Helios NanoLab DualBeam FIB-SEM combines focused ion beam (FIB) and scanning electron microscopy (SEM) capabilities for high-resolution imaging, precision milling, and nanofabrication. It features advanced detectors for high-contrast imaging, along with electron beam-induced deposition (EBID) capabilities for nanofabrication and patterning. This system is ideal for 3D reconstructions, subsurface analysis, and TEM sample preparation.

STEMart provides high-quality advanced microscopy services tailored to meet the specific needs of our clients. Our experienced specialists use advanced equipment and follow strict quality control measures to ensure accurate and reliable results. Contact us to learn more about our advanced microscopy services and how we can help you achieve your research goals.

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