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Plasma based techniques are considered as one of the most important tools for the development of advanced technologies. One of the problems in plasma technologies, especially in the field of thin film processing and microprocessor fabrication, is the formation of nanoparticles. These nanoparticles are formed spontaneously during the plasma process and can grow rapidly up to a size of several hundreds of nanometers. A direct measurement of the optical properties of carbonaceous nanoparticles as a function of size is of large interest, in particular, at small radii.