Characterization of Polysiloxanes by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) (CAT#: STEM-ST-1799-CJ)

Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) is a surface-sensitive analytical method that uses a pulsed ion beam (Cs or microfocused Ga) to remove molecules from the very outermost surface of the sample. The particles are removed from atomic monolayers on the surface (secondary ions). These particles are then accelerated into a "flight tube" and their mass is determined by measuring the exact time at which they reach the detector (i.e. time-of-flight). Three operational modes are available using ToF-SIMS: surface spectroscopy, surface imaging and depth profiling.

Analytical Chemistry

1. Sample preparation: The sample is prepared by cleaning it to remove any contaminants that could interfere with the analysis. The sample may also be coated with a thin layer of conductive material to prevent charging during analysis.
2. Primary ion bombardment: The sample is bombarded with a beam of high-energy primary ions, typically from an ion gun. The primary ions interact with the atoms on the surface of the sample, causing the ejection of secondary ions, neutrals, and electrons.
3. Secondary ion extraction: The secondary ions are extracted from the sample surface using a high voltage electric field. The extracted ions are accelerated towards the mass spectrometer.
4.Mass separation: The ions are separated by their mass-to-charge ratio (m/z) using a mass spectrometer. The ions are then detected by an ion detector, which measures their abundance.
5. Data analysis: The data is analyzed to determine the elemental and isotopic composition, as well as the chemical structure and molecular fragmentation patterns of the sample. This information can be used to identify the material and understand its properties and behavior.

• Sample: Solid thin layer; Flat surface material; Powder; Metals; Semiconductors and Insulators & More
• Equipment: Dynamic Secondary Ion Mass Spectrometry (D-SIMS) instruments

1. Surveys of all masses on material surfaces; these may include single ions (positive or negative), individual isotopes, and molecular compounds.
2. Elemental and chemical mapping on a sub-micron scale.
3. High mass resolution, to distinguish species of similar nominal mass (mass resolution is at least 0.00x amu).
4. High sensitivity for trace elements or compounds, on the order of ppm to ppb for most species;.
5. Surface analysis of insulating and conducting samples.
6. Depth profiling (in the near surface environment, on the order of individual atomic layers to 10s of nanometers).
7. Non-destructive analysis.
8. Retrospective analysis, for post-data acquisition analysis and interpretation of stored images and spectra.