Thermal Conductivity Measurements of Si3N4 thin films by 3ω-method (CAT#: STEM-PPA-0042-WXH)

Introduction

Silicon Nitride (Si3N4) offers one of the greatest cross-sections of material properties across both oxide and non-oxide fine ceramic groups. It is a specialist solution for extreme working environments, meeting the requirements for some of the harshest industrial conditions on earth.
The applications of thin film technologies are increasing. A variety of different ceramic and hard coating materials are deposited. Silicon nitride is one of the materials which seems to be quite interesting for the use as coating material. An use as a wear and corrosion protective coating seems to be conceivable.